Academic Members Interests
The following list highlights the research, teaching and
consulting expertise/interests of each of the CICMHE academic
members:
Kimberly Ellis
Virginia Tech
Primary research interests include operations planning and
manufacturing logistics (for production, distribution, and
material handling systems). Specific focus involves
collaborating with industry to develop decision support tools
to improve material flow for manufacturing and distribution
systems.
Kevin Gue
Auburn University
Primary research interests are in logistics modeling and
optimization, including problems in distribution, production,
warehousing, material handling, and storage systems design.
Specific interests include interactions among workers in
industrial settings and models of congestion, both among
workers and machines.
Dr. Andrés L. Carrano
Rochester Institute of Technology
Manufacturing systems, production control, facilities planning, design for the environment, lifecycle assessment, and trad-off modeling in sustainability.
Dr. Donald E. Eisenstein
University of Chicago
Analysis of logistical systems including production, material handling, warehousing, distribution, order-picking, scheduling, routing, inventory, and e-commerce.
Dr. Leon F. McGinnis, P.E.
Georgia Institute of Technology
Complexity and design of manufacturing logistics systems, applied computation and optimization.
James A. Rumpf
Ferris State University
Throughput improvement, facilities planning and optimization using computer simulation, mechanical handling applications for automating manufacturing processes, green manufacturing and computer-based training applications.
Dr. Uday Venkatadri
Dalhousie University
Facilities design, supply chain management, production planning and control, software systems, demand management, ERP, group technology, cellular manufacturing, operations research and linear programming.
Dr. J. René Villalobos
Arizona State University
Logistics, automated quality systems, manufacturing systems and applied operations research.